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Infrared Sub-nanosecond Laser

NPFL-80IR-1.01

Machine Features

1. Sub-nanosecond pulses；near diffraction-limited beam quality ;high peak energy and high peak power

2. Unique all-fiber optical configuration, delivering superior machining performance compared with other sub-nanosecond lasers in semiconductor and photovoltaic industries, with excellent stability.

3. Adjustable repetition rate

4. Compact structure and small footprint

Applications

Cutting, drilling and scribing (glass, silicon, ceramic);

Thin-film patterning (metals, thin films);

Marking (glass, silicon, ceramic, metals, plastics).

Technical Data Sheet

Machine Model	Infrared Sub-nanosecond Laser NPFL-80IR-1.01
Operating Mode	Pulsed
Average Power（W）	80
Central Wavelength（nm）	1064
Spectral Linewidth（nm）	＜30; 3dB Linewidth
Repetition Rate（kHz）	100-2000; Tunable
Pulse Width（ns）	0.1-0.2ns; Customizable
Max. Single Pulse Energy（mJ）	0.8
Power Adjustment Range（%）	0-100
Response Time（us）	＜100
Beam Quality（M2）	≤1.5
Power Stability（%）	≤3%; 24h
Beam Spot Size（mm）	3.0±0.2; 1/e2
Beam Ellipticity（%）	＞90; Typ.92%
Beam Offset（mm）	＜1.0
Beam Divergence Angle（mrad）	＜0.5

Cookies Consent

Han's Laser Solutions

Infrared Sub-nanosecond Laser

NPFL-80IR-1.01

Applications

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