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Machine Model | Green Sub-nanosecond Laser NPFL-50G-1.0 |
Operation Mode | Pulsed |
Average Power(W) | 50 |
Central Wavelength(nm) | 532 |
Linewidth(nm) | <10 ; 3dB Linewidth |
Repetition Frequency(kHz) | 1500-2200 ; Adjustable |
Pulse Width(ns) | 0.6-4ns ; Adjustable |
Power Tuning Range(%) | 0-100 |
Response Time (μs) | <5 |
Beam Quality(M2) | ≤1.1 |
Power Stability(%) | ≤5% ; 24h |
Spot Size(mm) | 1.2±0.3 ; 1/e2 |
Spot Ellipticity(%) | >90 ; Typ.95% |
Beam Offset(mm) | <2.0 |
Beam Divergence(mrad) | <0.5 |
This laser adopts an all-fiber optical design and delivers sub-nanosecond laser output with near-diffraction-limit beam quality and outstanding stability. It is widely applicable to multiple sectors including semiconductors, photovoltaics and new energy. It is widely used in:
Cutting, drilling and scribing for glass, silicon and ceramics
Thin-film patterning for metals and thin films
Marking on glass, silicon, ceramics, metals and plastics