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HALO Series Two‑in‑One PECVD
Applications

HALO Series Two‑in‑One PECVD

Machine Features

1. Graphite‑boat Electrode Technology: Adopts front‑electrode surface contact design. Electrode blocks can be periodically replaced and cleaned. The tail electrode is adjustable outside the furnace tube. Larger‑size electrodes and optimized electrode material effectively resolve frequent alarm issues.

2. Fast‑Cooling Furnace Body: Equipped with the latest patented technology, the furnace body can be rapidly cooled down to target temperature. The cooling rate is increased by over 25 %, significantly improving temperature uniformity within the furnace tube.

3. Patented Parallel Heat‑Dissipation for Boat‑Storage Station: Enhances cooling performance and shortens cooling cycle by more than 15 %. Meanwhile, front-side air intake improves internal cleanliness of the operating console.

4. Special auxiliary lifting tool for quartz tubes greatly reduces the difficulty in installation, maintenance and replacement of quartz tubes.

5. Delivers higher film compactness than films deposited via remote‑plasma processes.

6. Achieves superior passivation performance compared with ALD.


Applications

Widely applied in high‑efficiency crystalline‑silicon PERC cell processes for depositing dense back‑passivation thin‑film materials such as aluminum oxide. It features continuous deposition of multiple composite films.


TOPCon Cell Process
Technical Data Sheet

Machine Model

HALO Series Two‑in‑One PECVD

Film Types

AlO,SiO,SiON,SiN,SiC

Loading Capacity

768 pcs/batch (182mm),616 pcs/batch (210mm),500 pcs/batch (230mm)

Al₂O₃ Film‑thickness Uniformity

Within‑wafer≤6%   Wafer‑to‑wafer≤6%   Batch‑to‑batch≤5%    (for 182 mm   wafers)

Al₂O₃ Refractive Index

1.65(±0.05)

UP-TIME

≥98%

Operating Temperature Range

100~600℃

Temperature Control

9‑point temperature control, dual internal‑external mode control

Heating Mode

Automatic ramp‑up & fast constant‑temperature function

Cooling Mode

Proprietary patented technology, active cooling furnace body with   9‑zone segmented control

Constant‑temperature Zone Accuracy & Length

±2°C/3200mm(500°C)

Single‑point Temperature Stability

<±1°C/4h(500°C)

Heating‑up Time

RT→450℃≤45min

Temperature Control

Precise dual‑mode control

System Ultimate Vacuum

<3Pa

System Leak‑rate

Pressure rise rate<1Pa/min after pump stop & valve closure

Pressure Control Mode

Fast‑adjustment fully‑automatic closed‑loop control

Process Control Mode

Fully‑automatic process control with multi‑level safety interlock   alarms

HMI

LCD display, touch operation, recipe editing, on‑line monitoring,   authority management, shift management, networking function

MES/CCRM

Available


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