UV Nanosecond Laser

Machine Features

1. Adjustable repetition frequency

2. Modular design

3. TEM00 mode output

4. High average power, up to 30W


Applications

Featuring ultra-small heat-affected zone from exclusive cold processing technology, this machine achieves ultra-fine machining and microstructure fabrication on non-metallic brittle materials in high-end manufacturing. It is widely used in 3C sector and key mobile phone production processes. Its total shipments surpass 15,000 units, ranking top in market share of equivalent lasers.

Application Scope:

1. Marking, depaneling, cutting and drilling of PCB & FPC

2. Micro-hole and blind-hole machining of silicon wafers

3. Solar cell processing

4. Silicon wafer scribing

5. Ceramic scribing, cutting and drilling

6. Ink and PVD coating removal

7. Material surface marking


Technical Data Sheet

Machine Model

HL-NS-355-5/10/15

HL-NS-355-20

Laser Characteristics

Wavelength

355nm

Power

5W/10W/15W

20W

Repetition Frequency

10-200 kHz

60-400khz

Pulse Width

10-100ns

20-100ns

Pulse Stability

<3%rms,1σ

<3%rms,1σ

Beam Characteristics

Spatial Mode

TEM00

M2

<1.3

Degree Of Polarization

 100:1 Horizontal

Spot Diameter

1.1 mm ±0.1mm

1.4mm ±0.2mm

Full Divergence Angle

 <2 mrad

Spot Symmetry

  >90%

Beam Directivity

<± 25 µrad/°C

Operating Conditions

Supply Voltage

100-240V,50 -60Hz

Warm-Up Time

Standby to ready:<10 mins;

Cold start to ready:<30 mins

Temperature Range

 Operating: 18~35°C;

Non-operating: 0~50°C

Humidity

10–90%, non-condensing

Cooling Method

Water cooling; Chiller accuracy: ±0.1°C;

Minimum flow rate: 6L/min

Total Power Consumption

<1000 W

Physical Characteristics

Laser Head Dimensions (L ×   W × H)

500mm×230.5mm×132mm

Laser Head Weight

18kg

Controller Dimensions (L × W × H)

477 mm× 440mm × 177mm

Controller Weight                                       

21kg