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Compact Photoresist Coating and Developing System CD06-XS1C1D1A

Machine Features

1. Compact footprint and excellent stability

2. Easy operation and maintenance

Applications

Photoresist coating and developing for Compound Semiconductors, Power Devices, MEMS, RF ICs, LEDs, Scientific‑research Projects and Optical Components.

OLED & LCD Panel Industry

Technical Data Sheet

Machine Model	Compact Photoresist Coating and Developing System CD06-XS1C1D1A
Cassette	2CS
wafer Type	Round Wafers
wafer Size（mm）	50-150
Throughput（WPH）	50
Substrate Materials	Si、Glass、Sapphire、GaN、GaAs、SiC、LiTaO3、Li3PO4
Processes	g-line、i- line、PI

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Sales Hotline

+86-400-666-4000